不同退火方式对0.7BiFeO_3-0.3PbTiO_3薄膜的铁电性能及漏电流的影响  

Effects of Different Annealing Technique on the Ferroelectric and Leakage Properties of 0.7BiFeO_3-0.3PbTiO_3 Thin Films

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作  者:李海敏[1] 郭红力[1] 李雪冬[1] 刘果[1] 肖定全[1] 朱建国[1] 

机构地区:[1]四川大学材料科学与工程学院,成都610065

出  处:《无机材料学报》2011年第10期1053-1057,共5页Journal of Inorganic Materials

基  金:国家自然科学基金(60771016)~~

摘  要:利用溶胶凝胶法在LaNiO3/SiO2/Si衬底上制备了0.7BiFeO3-0.3PbTiO3(BFPT7030)薄膜,研究了快速退火及常规退火两种不同的后续退火处理方式对薄膜铁电性能及漏电流性能的影响.XRD测试表明,经快速退火处理的BFPT7030薄膜结晶完好,呈现出单一的钙钛矿相.SEM测试结果显示,经快速退火处理的BFPT7030薄膜结晶充分,但经常规退火处理的BFPT7030薄膜表面致密性较好,且在升温速率为2℃/min时薄膜的晶粒更细小.经快速退火处理的BFPT7030薄膜的铁电性能较为优异,在升温速率为20℃/s时,其剩余极化Pr为22μC/cm2,矫顽场Ec为70 kV/cm,并具有较小的漏电流.XPS测试结果表明,经常规退火处理的BFPT7030薄膜其铁离子的价态波动较小.0.7BiFeO3-0.3PbTiO3(BFPT7030) thin films were prepared on LaNiO3/SiO2/Si substrates by Sol-Gel process.The films were annealed by rapid thermal annealing technique(RTA) and conventional thermal annealing(CTA) technique,respectively.XRD patterns of the films indicate that BFPT7030 films annealed by RTA show a single perovskite phase and better crystallinity as suggested by stronger and sharper XRD peaks.SEM observations demonstrate that BFPT7030 films annealed by RTA are fully crystallized,but films annealed by CTA have a dense morphology and exhibits small grain size especially for film heated at rate of 2℃/min.Enhanced ferroelectric properties are observed in the films annealed by RTA.The film heated at rate of 20℃/s exhibits a remnant polariza-tion of 22 μC/cm2 with a low coercive field of 70 kV/cm.And lower leakage current density is observed in BFPT7030 films annealed by RTA as compared to BFPT7030 films annealed by CTA.XPS analyses demonstrate that the oxidation state of Fe ions is the coexistence of both Fe3+ and Fe2+ in the BFPT7030 films annealed by RTA and CTA,but less fluctuation of Fe3+ to Fe2+ exists in the BFPT7030 films annealed by CTA.

关 键 词:溶胶凝胶 BiFeO3-PbTiO3 薄膜 快速退火 常规退火 

分 类 号:TQ12[化学工程—无机化工]

 

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