基于子图的草图设计和约束求解  

Subgraph-based Sketch Design and Constraint Solving

作　　者：董洪伟[1] 

机构地区：[1]江南大学物联网工程学院,江苏无锡214122

出　　处：《计算机时代》2011年第11期1-3,6,共4页Computer Era

摘　　要：提出了一种基于子图的拟序列化草图设计方法。基于标识的约束模型统一了二维、三维约束,使得每个几何元素对应唯一的标识,几何元素之间的约束关系表示为标识之间的约束,这些约束被分为结构约束和尺寸约束。提出了基于序列化设计过程的约束求解方法。实验表明,该技术可快速有效地进行参数化草图设计和特征编辑。A subgraph-based quasi-sequential sketch design approach is presented.The identifier-based constraint model unifies the 2D and 3D constraints,and makes each geometric element correspond to a unique identifier.The constraints between geometric elements are represented as the constraints between identifiers,and these constraints are classified into structural constraints and dimensional constraints.A constraint solving method based on sequential design process is proposed.The experiments show that the technique can conduct parametric sketching and feature editing rapidly and efficiently.

关 键 词：草图设计 参数化设计 特征编辑 约束求解 

分 类 号：TP391[自动化与计算机技术—计算机应用技术]