Penning型负氢离子源诊断  

Diagnosis of Penning-type negative hydrogen ion source

作　　者：董攀[1] 龙继东[1] 杨振[1] 王韬[1] 何小中[1] 张开志[1] 

机构地区：[1]中国工程物理研究院流体物理研究所,四川绵阳621900

出　　处：《强激光与粒子束》2011年第9期2503-2506,共4页High Power Laser and Particle Beams

基　　金：中国工程物理研究院军民两用技术开发项目(JM200701)

摘　　要：为了给小型医用回旋加速器提供负氢离子,研制了一台Penning型负氢离子源。采用发射光谱法对该负氢离子源进行了诊断,同时结合离子源功率变化对离子源工作状态进行了分析。实验测量了不同氢气流量、离子源弧流及磁场条件下,该离子源等离子体氢原子巴尔末系中前三条谱线的相对光强和离子源功率变化,分析了不同工作条件对离子源工作状态的影响。结果表明:在可调节范围内,该离子源的工作状态主要受氢气流量的影响,对离子源弧流及磁场的变化不敏感。A Penning-type negative hydrogen ion source was diagnosed by emission spectrometry,and the source arc power was measured under different conditions in the meantime.The ion source was designed to offer negative hydrogen to a small medical cyclotron.The relative intensities of the first three lines in hydrogen Balmer series of the ion source and the source arc power were measured under different hydrogen flows,source arc currents and magnetic fields,and then the ion source＇s working status was analyzed under these conditions.The result indicates that,the working status of the ion source is not sensitive to the variations in arc current and magnetic field,and mainly affected by hydrogen flow.

关 键 词：Penning型离子源 等离子体 发射光谱 离子源功率 

分 类 号：O536[理学—等离子体物理]