调制周期对ReB_2/TaN纳米多层膜的结构和力学性能影响  

Effect of Modulation Period on Structure and Mechanical Properties of ReB_2/TaN Nanoscale Nanomultilayers

作　　者：刘广庆[1] 张帅[1] 刘孟寅[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《材料工程》2011年第10期58-60,65,共4页Journal of Materials Engineering

基　　金：国家自然科学基金(50872094);天津市应用基础及前沿技术研究计划重点项目(2012)

摘　　要：利用射频磁控溅射方法(衬底温度20℃)制备TaN,ReB2单层膜及ReB2/TaN纳米多层膜,并通过XRD,SEM,XP-2表面轮廓仪及纳米力学测试系统对薄膜的微结构和力学性能进行表征,分析调制周期对其影响。结果表明:TaN和ReB2均具有典型的六方结构,在其构成的多层膜中,当调制周期达到8～12nm附近时,纳米多层膜的硬度和弹性模量均高于两种材料所构成单层膜的相应值。在Λ=9.6nm,多层膜达到最高硬度(28.8GPa)及弹性模量(345.9GPa),同时内应力取得较好结果。A series of nanoscale ReB2/ TaN multilayered coatings were prepared by ultra-high vacuum RF magnetron sputtering system at 20℃.The influence of modulation period（Λ） on the microstructure and mechanical properties of the film was investigated by SEM,XRD,surface profiler and nano-indenter.The results showed that ReB2 and TaN layers exhibited hexagonal structure in films.ReB2/TaN multilayers have superhard effects with a modulation period from 8-12nm.At Λ=9.6nm,ReB2/TaN multilayered possessed the highest hardness of 28.8GPa and modulus of 345.9GPa with lower residual stress.

关 键 词：射频磁控溅射 ReB2/TaN纳米多层膜 调制周期 硬度 

分 类 号：TG174.444[金属学及工艺—金属表面处理]