椭圆偏振光谱法测定磁性薄膜的光色散特性  

Determination of Optical Dispersion of Magnetic Films by Spectroscopic Elltipsometry

作　　者：徐梅娣[1] 刘湘林[1] 

机构地区：[1]中国科学院上海冶金研究所

出　　处：《仪器仪表学报》1990年第4期357-361,共5页Chinese Journal of Scientific Instrument

摘　　要：本文报导了用变波长的椭偏仪研究磁性薄膜的光色散特性的工作。在波长为3000～6200(?),入射角φ=70.0°的条件下,测量了铁膜、镍膜、坡莫(Fe-Ni)合金膜及磁光石榴石单晶膜的折射率n(λ)、消光系数K(λ)和解电常数ε(λ)的谱线。并对此结果进行了讨论。This paper reportes studies of optical dispersion of magnetic fil-ms by changeable wavelength ellipsometry.At wavelength region of 3000～6200(?),using TPP-1 type spectroscopic ellipsometry(SE),the spectra of refractionindex(n),extinction coefficient(k)and complex permitivity(ε)for mag-netic films were measured and discussed.The spectra of magnetic films show surface treatment,structure and prepar-ing technique have an effect on their optical properties to gain the informationfor analyess of film composition and research of electric transition.

关 键 词：椭圆偏振光谱 磁性薄膜 光色散特性 

分 类 号：O484.5[理学—固体物理]