控制电位脉冲电沉积法制备析氢Ni-S电极  

Ni-S Electrode for Hydrogen Evolution Prepared by Controlled Potential Pulse Electro-deposition

作　　者：杜鑫[1] 刘勇[1] 

机构地区：[1]内江师范学院化学化工学院,四川内江641112

出　　处：《电镀与精饰》2011年第11期40-43,共4页Plating & Finishing

基　　金：四川省青年基金项目(07ZB044)

摘　　要：采用控制电位脉冲电沉积法制备Ni-S合金电极,并在25%NaOH溶液中测试阴极极化曲线和交流阻抗,表征所制备电极的催化析氢活性。探讨了脉冲电流密度,脉冲限制电位及硫脲加入量对电沉积的影响,确定了电沉积制备Ni-S电极的适宜条件。结果显示:脉冲电流密度为7.1 A/dm2,脉冲电位上限为-0.70 V,脉冲电位下限为-1.75 V,V(瓦特镍溶液)(290 g/L NiSO4.6H2O,50 g/LNiCl2.6H2 O,40 g/L H3 BO3)与V(10%硫脲)比值为20∶8,制备的Ni-S电极具有最高的催化析氢性能。Ni-S electrode was prepared by controlled potential pulse electro-deposition,then cathodic polarization curves and electrochemistry impedance were measured in 25% NaOH solution to analyze the electrode＇s activity of catalytic hydrogen evolution.Effects of pulse current density,pulse limit potential and thiourea（TU） addition amount upon electro-deposition were discussed.Appropriate conditions of electro-deposition for Ni-S electrode preparation were determined.Results showed that when pulse current density was 7.1 A/dm2,upper limit of pulse potential was-0.70 V while the lower limit was-1.75 V,volume ratio of Watts Ni bath（290 g/L NiSO4·6H2O,50 g/L NiCl2·6H2O,40 g/L H3BO3）and TU（10%） was 20 ∶8,the Ni-S electrode prepared has the highest performance of catalytic hydrogen evolution.

关 键 词：脉冲电沉积 Ni-S电极 电解水 析氢过电位 

分 类 号：TQ150.6[化学工程—电化学工业]