抛光参量对抛光光学元件亚表层的影响  

Influences of Polishing Parameters on Subsurface Damage of Polishing Components

作　　者：王桃芬[1] 张循利[2] 时宝国[2] 

机构地区：[1]湖南科技大学物理学院,湘潭411201 [2]滨州学院物理系,滨州256600

出　　处：《航空精密制造技术》2008年第1期25-27,共3页Aviation Precision Manufacturing Technology

摘　　要：研究了抛光粉的种类、抛光速度的大小以及抛光玻璃的性质等抛光参量对光学元件亚表层特征的影响,并结合抛光机理进行了分析。The influence of the parameters during the polishing process such as the types of polishing powder, the polishing speed, the characters of the polishing glass, on the properties of the polished components has been studied, and the detailed analysis has been made based on the polishing theory.

关 键 词：抛光 亚表层缺陷 抛光粉 熔石英 抛光速度 

分 类 号：TG580.692[金属学及工艺—金属切削加工及机床]