The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation  被引量:2

The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation

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作  者:DENG Wen CHEN ZhenYing JIANG HaiFeng SUN ShunPing ZHU YingYing HUANG YuYang 

机构地区:[1]College of Physics Science and Technology,Guangxi University,Nanning 530004,China [2]Department of Physics and Chemistry,Henan Polytechnic University,Jiaozuo 454000,China [3]International Centre for Materials Physics,Chinese Academy of Sciences,Shenyang 110016,China

出  处:《Science China(Physics,Mechanics & Astronomy)》2008年第9期1221-1228,共8页中国科学:物理学、力学、天文学(英文版)

基  金:the National Natural Science Foundation of China (Grant No 50361002);Guangxi University Key Program for Science and Technology Research (Grant No 2003ZD04);the Natural Science Foundation of Guangxi Province (Grant No 0480004)

摘  要:Information of defects and 3d electrons in transition metals (Ti,V,Cu) and TiAl-based alloys (Ti50Al50,Ti50Al48V2,Ti50Al48Cu2) can be extracted from the positron lifetime and coincidence Doppler broadening spectra. The results show that the 3d electron signals for the transition metals Ti,V and Cu increase with the number of 3d electrons. The 3d electron signal and the electron density for binary TiAl alloy are relatively low due to the (Ti)3d-(Al)3p interactions. The addition of V and Cu atoms to TiAl alloy leads to the increase in the electron densities in bulk and the defects on grain boundaries simultaneously,as well as the enhancement of the 3d electron signal. The 3d electron signal in the spectrum of Ti50Al48Cu2 alloy is higher than that of Ti50Al48V2 alloy.Information of defects and 3d electrons in transition metals (Ti, V, Cu) and TiAl-based alloys (Ti50Al50, Ti50Al48V2, Ti50Al48Cu2) can be extracted from the positron lifetime and coincidence Doppler broadening spectra. The results show that the 3d electron signals for the transition metals Ti, V and Cu increase with the number of 3d electrons. The 3d electron signal and the electron density for binary TiAl alloy are relatively low due to the (Ti)3d-(Al)3p interactions. The addition of V and Cu atoms to TiAl alloy leads to the increase in the electron densities in bulk and the defects on grain boundaries simultaneously, as well as the enhancement of the 3d electron signal. The 3d electron signal in the spectrum of Ti50Al48Cu2 alloy is higher than that of Ti50Al48V2 alloy.

关 键 词:TIAL alloy 3d electron DEFECT POSITRON ANNIHILATION 

分 类 号:TG146.23[一般工业技术—材料科学与工程]

 

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