Study on Diamond Thin Films Deposition in a Quartz Bell-jar Type System for MWPCVD  

作　　者：俞世吉 丁振峰 马滕才 邬钦崇 

出　　处：《Plasma Science and Technology》2000年第1期161-165,共5页等离子体科学和技术（英文版）

基　　金：the 863 Hi-Tech plan fund of China

摘　　要：Diamond thin films were prepared in a modified quartz bell-jar type microwave chemical vapor deposition (MWPCVD) system. The influences of process parameters on MWPCVD diamond thin films quality such as substrate pretreatment, deposition gas ratio, deposition pressure and substrate position were examined and studied. The deposited films were characterized by using Scanning electron microscopy(SEM) and Raman spectroscopy. It was shown that this quartz bell-jar type MWPCVD system is beneficial to the deposition of high quality diamond thin films.Diamond thin films were prepared in a modified quartz bell-jar type microwave chemical vapor deposition (MWPCVD) system. The influences of process parameters on MWPCVD diamond thin films quality such as substrate pretreatment, deposition gas ratio, deposition pressure and substrate position were examined and studied. The deposited films were characterized by using Scanning electron microscopy(SEM) and Raman spectroscopy. It was shown that this quartz bell-jar type MWPCVD system is beneficial to the deposition of high quality diamond thin films.

关 键 词：Study on Diamond Thin Films Deposition in a Quartz Bell-jar Type System for MWPCVD 

分 类 号：TN304.0[电子电信—物理电子学]