非晶TbCo/Si多层膜的磁性和磁光特性  

THE MAGNETIC AND MAGNETO OPTIC PROPERTIES OF THE AMORPHOUS TbCo/Si MULTILAYERS

作　　者：陈熹[1] 王荫君[1] 梁冰青[1] 王晶[1] 李健[1] 

机构地区：[1]中国科学院物理研究所与凝聚态物理中心磁学国家重点实验室,北京100080

出　　处：《物理学报》1999年第S1期224-229,共6页Acta Physica Sinica

摘　　要：利用射频磁控溅射方法制备了非晶ＴｂＣｏ／Ｓｉ 多层膜，并对多层膜的磁性和磁光特性进行了测量．实验发现，随着Ｓｉ 层厚度的增加，非晶ＴｂＣｏ／Ｓｉ 多层膜的饱和磁化强度 Ｍｓ、垂直各向异性常数Ｋｕ 、磁光克尔角θＫ 都显著下降．分析认为这是由于在ＴｂＣｏ 层与Ｓｉ 层之间的层间互扩散形成了非磁性的Ｃｏ２Ｓｉ 所致．The Tb\-\{0.17\}Co\-\{0.83\}/Si multilayers prepared by a rf magnetron sputtering system with different Si thickness have been investigated. X\|ray diffraction, magnetic measurement and Kerr rotation have been performed. With increasing thickness of Si layer t Si , the perpendicular anisotropy constant K u decreased rapidly. The saturation magnetization M s and the Kerr rotation θ K decreased linearly when t Si increased. It was assumed that Co\-2Si and Tb had been formed in the interfacial zone between TbCo and Si layers. The reduction of K u, M s and θ K is attributed to the decrease of the effective thickness of magnetic layer, which is linear with t Si .

关 键 词：各向异性常数 饱和磁化强度 Si多层膜 垂直各向异性 非晶 凝聚态物理 国家重点实验室 互扩散 克尔角 反铁磁耦合 

分 类 号：O484.4[理学—固体物理]