新型MoS_2基润滑及防冷焊薄膜性能的研究  

STUDY ON THE LUBRICATION AND ANTI-COLD-WELD PERFORMANCES OF NEW MoS_2-BASED COSPUTTERED FILMS

作　　者：翁立军[1] 孙晓军[1] 汪晓萍[1] 李陇旭[1] 孙嘉奕[1] 于德洋[1] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑开放研究实验室

出　　处：《空间科学学报》1996年第S1期60-65,共6页Chinese Journal of Space Science

基　　金：国家自然科学基金

摘　　要：ＭＯＳ２溅射薄膜是空间机械应用最广的润滑薄膜材料之一，但其在潮湿空气中却存在着润滑性能退化甚至失效的问题．作者依据基础研究及使用要求，研制出新型射频共溅射ＭＯＳ２基（ＭＯＳ２－４）薄膜．结果表明，ＭＯＳ２－４共溅射薄膜具有良好的摩擦学特性和耐潮湿性能．与ＭｏＳ２溅射薄膜比较，其在真空环境中的耐磨寿命提高４倍以上．多组元之间的协同效应是使薄膜性能大幅度改善的根本原因．The MoS2 sputtered films are widely used for space mechanism, but their tribological behavior would degrade and fail after storage in the moist air for a certainperiod. In this paperl new MoS2-based cosputtered films (MoS2-4) are studied. Theresults show that the MoS2-4 films exhibit good tribological behavior after storagein moist air for a period of time. The wear endurance of MoSZ--4 films is 4 timesmore than that of MoS2 sputtered films in vacuum. The multicomponent synergisticeffect extensively improve the tribological behavior of MoS2-4 films.

关 键 词：MoS₂基共溅射薄膜 真空 摩擦学性能 耐湿热性能 协同效应 

分 类 号：TG174.44[金属学及工艺—金属表面处理]