Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION  

作　　者：Wei Min CAO Kun Lin ZHOU Rui Hua ZHOU(Chengdu institute of Organic Chemistry, Academia Sinica, Chengdu, 610041) 

出　　处：《Chinese Chemical Letters》1994年第7期631-634,共4页中国化学快报（英文版）

摘　　要：Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl. The deposited des contained C, Ni, H, O and small amounts of N. Nickel existed in forms of metric Ni and Ni2O3. The oxidation of nickel mainly occurred on film surface. With lower Ni contents, the film maintained the structure of DLC film. With the increase of Ni content, the films showed some crystalline features of Ni and Ni2O3.Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl. The deposited des contained C, Ni, H, O and small amounts of N. Nickel existed in forms of metric Ni and Ni2O3. The oxidation of nickel mainly occurred on film surface. With lower Ni contents, the film maintained the structure of DLC film. With the increase of Ni content, the films showed some crystalline features of Ni and Ni2O3.

关 键 词：RF Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION 

分 类 号：O627[理学—有机化学]