Alkali-metal Na Adsorption and Promoted Oxidation on Si(100)2×1 Surface  

作　　者：Shihong XU Pengshou XU Mingrong JI Xianming LIU Maosheng MA Jingsheng ZHU Yuheng ZHANG Structure Research Laboratory,University of Science and Technology of China,Hefei,230026,ChinaZhenjia XU Institute of Semiconductor,Academia Sinica,Beijing,100083,China 

出　　处：《Journal of Materials Science & Technology》1993年第6期437-440,共4页材料科学技术（英文版）

摘　　要：The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxide growth have been investigated by means of thermal desorption,work function,Auger electron spectroscopy and photoemission electron spectroscopy.The experimental data showed that there was a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It was found that the presence of Na always caused an increase of the oxygen initial uptake whereas the promotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A new mechanism of Na-promoted Si oxide growth is suggested in this paper.The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxide growth have been investigated by means of thermal desorption,work function,Auger electron spectroscopy and photoemission electron spectroscopy.The experimental data showed that there was a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It was found that the presence of Na always caused an increase of the oxygen initial uptake whereas the promotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A new mechanism of Na-promoted Si oxide growth is suggested in this paper.

关 键 词：ADSORPTION promoted oxidation interface SURFACE 

分 类 号：TB3-55[一般工业技术—材料科学与工程]