应用于低密度等离子体产生的气体靶模拟  

Simulation study on gas targets applied to underdense plasma generation

作　　者：马占南[1] 王晓方[1] 

机构地区：[1]中国科学技术大学近代物理系,中国科学院基础等离子体物理重点实验室,合肥230026

出　　处：《强激光与粒子束》2011年第10期2687-2691,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(10876039,11075160)

摘　　要：利用流体力学计算软件对两种结构气体靶进行了数值模拟和分析。对于充气型毛细管气体靶,在充气达到稳定状态后,形成稳定的层流。气体密度的空间分布均匀,两进气口之间的密度不均匀性仅约1%。毛细管的结构参数如进气口的位置和宽度对气体密度分布的边缘有较大影响,但是对管内气体密度分布影响很小。采用锥形喷气靶可使气体密度分布的边缘更陡些,但是这种靶的超声流动可出现湍流,导致不稳定的气体流动以及更不均匀的气体密度分布。Numerical simulations and analyses are done on two types of gas targets by using a computational fluid-dynamics software.For a gas-filling capillary,a stable laminar flow can be formed.It can produce a uniform density distribution and the nonuniformity between the two inlets is only 1%.The capillary parameters such as the capillary＇s inlet locations and the inlet width have evident influence on the density profiles around the capillary＇s ends,but negligible on the density-profile distributions inside the capillary.For a conical gas jet,it can make the end-density profile steeper than that of the capillary.But the supersonic flow of the gas jet may cause turbulence,which may cause the gas flow unstable and the gas-density profile less uniform.

关 键 词：气体靶 流体力学模拟 气体密度分布 均匀性 

分 类 号：O539[理学—等离子体物理] O369[理学—物理]