源搅拌对混响室场均匀性的改善  

Improvement of field uniformity by stirring source in reverberation chamber

作　　者：李爽[1] 王建国[1,2] 

机构地区：[1]西北核技术研究所,西安710024 [2]西安交通大学电子信息工程学院,西安710049

出　　处：《强激光与粒子束》2011年第10期2724-2728,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(60971080)

摘　　要：研究了在短脉冲波激励下,源搅拌方法对混响室内场分布的影响效果。分析了混响室内场分布特征的影响因素,得到了影响源搅拌的相关参量。研究改变激励源的位置对腔体内场分布的影响效果,主要对比了电场的最大值、分布标准差等电场统计特征。结果表明:通过连续地移动激励源对场分布进行搅拌,混响室内的电场最大值可以达到约6.7kV/m,而且场值的空间分布标准差降至3dB以下,能量分布也更加均衡。因此,采用源搅拌方法可以有效地改善腔内的场分布,提高场分布的均匀性,有利于构造均匀的电磁场环境。This article mainly studies the influence of source stirring on the field characteristics,especially the field uniformity,in the reverberation chamber under short pulse excitation.Firstly,the factors that may affect the field distribution are summarized.Then the focus is on the effects of moving the sources consecutively on the electromagnetic field distributions,including the maximum and the standard deviation of electric field strength.The results show that the maximum of electric field strength can reach as high as 6.7 kV/m and the standard deviation of the field distribution falls below 3 dB after stirring the sources.Therefore,the method of source stirring can improve the field uniformity effectively and it is useful in the construction of homogenous electromagnetic field environment.

关 键 词：混响室 高功率微波 源搅拌 场均匀性 

分 类 号：O441.4[理学—电磁学]