电感耦合等离子体原子发射光谱法测定高合金钢中钒  

Determination of vanadium in high alloy steel by inductively coupled plasma atomic emission spectrometry

作　　者：聂玲清[1] 王宏清[1] 徐元财[1] 张玲[1] 

机构地区：[1]宝山钢铁股份有限公司研究院,上海201900

出　　处：《冶金分析》2011年第11期38-43,共6页Metallurgical Analysis

摘　　要：为了满足钢的研发以及生产要求,建立了利用电感耦合等离子体原子发射光谱(ICP-AES)法测定高合金钢中钒?的方法。考察了钒常用的谱线与高合金钢中常见合金元素谱线的重叠干扰情况,选择了V292.402nm和V309.311nm谱线作分析线,并通过基体匹配、空白扣除、干扰系数校正和不扣除背景等方式进行干扰校正。用本法对含钒质量分数为0.005%～4%的高合金钢标准物质进行测定,测定值与认定值吻合,测定结果的相对标准偏差小于5%(n=7)。In order to meet the requirements of research and development and production,the determination of vanadium in high alloy steel by inductively coupled plasma atomic emission spectrometry（ICP-AES） was established.The overlapping between common spectral lines of vanadium and alloying elements in steel was investigated.The V292.402 nm and V309.311 nm were selected as analytical lines.The interference correction was performed by matrix matching,blank deduction,interference coefficient correction and nondeductible background.The proposed method was used to the determination of certified reference materials of high alloy steel with mass fraction of 0.005 %-4 % for vanadium.The found results were consistent with the certified values.The relative standard deviation（RSD,n=7） was less than 5 %.

关 键 词：电感耦合等离子体原子发射光谱法 高合金钢 钒 干扰校正 

分 类 号：O657.31[理学—分析化学]