外加高频电场对核径迹化学蚀刻过程及微孔形态影响研究  

Influence of High Frequency Ex-electric Field on Etching Process and Shape of Pores for Nuclear Track Film

作　　者：陈晖[1] 王玉兰[1] 徐世平[1] 王建晨[1] 

机构地区：[1]清华大学核能与新能源技术研究院,北京100084

出　　处：《原子能科学技术》2011年第7期852-855,共4页Atomic Energy Science and Technology

摘　　要：为研究聚对苯二甲酸乙二醇酯(PET)单面蚀刻的详细过程,利用自制蚀刻装置的电流信号对核孔膜单面蚀刻过程进行监测。对装置的本底电流进行研究分析,发现本底电流主要由装置中的电容控制,受膜厚影响,与温度无关。利用装置的电流信号对蚀刻过程进行了记录,根据电流信号的变化可将整个蚀刻过程分为3个阶段。综合研究了外加高频交流电场的有无及强度对蚀刻过程、通孔时间及核孔膜微孔孔形的影响。发现高频交流电场的存在使通孔时间缩短;在相同的蚀刻条件下,孔形更接近柱形,且这两种作用随着电场强度的增加而加强,并在10V/cm的电场强度附近时达到饱和。To assess the details of the chemical etching process of polyethylene terephthalate（PET）,the current signals during the whole etching process were recorded with the etching apparatus.The background-current was studied,which illustrated that it was mainly determined by the electric capacity of the etching system and was influenced by the thickness of the membrane but not by the temperature.According to the record of the current change during the etching process,it was found that the process can be divided into three phases.The influences of the existence and intensity of the ex-electric field on the breakthrough time and shape of pores were also studied.The existence of ex-electric field could shorten the breakthrough time and shape the pores more close to column.And these two phenomenons could be strengthened as the intensity of the electric field rose,and yet would reach a plateau when the intensity gets near 10 V/cm.

关 键 词：高频电场 蚀刻 通孔时间 

分 类 号：TQ150[化学工程—电化学工业]