基质折射率对反常色散散射体散射特性的影响  

The influence of mediums' refractive index on scattering characteristics of abnormal dispersion scatterer

作　　者：徐庆君[1] 庄申栋[1] 韦德泉[1] 田贵才[1] 

机构地区：[1]枣庄学院光电工程学院,枣庄277160

出　　处：《原子与分子物理学报》2011年第6期1164-1168,共5页Journal of Atomic and Molecular Physics

基　　金：山东省优秀中青年科学家科研奖励基金项目(2008BS01021);枣庄市科技攻关计划项目(201031-2);2008年枣庄学院科技计划项目(2008ZD04);2009年枣庄学院科技计划项目(2009QN11)

摘　　要：基于Mie散射理论,给出了散射强度、散射截面及吸收截面的计算公式,并对不同基质中碳化硅材料在反常色散区中的散射特性进行了数值计算与理论分析.结果表明,在反常色散区中,随着基质折射率的增大,散射强度的峰位发生红移,峰值增大;散射截面和吸收截面的峰位发生红移,峰值减小,这为该材料在反常色散区中的光学理论、实验及应用方面提供了理论参考.Based on the Mie scattering theory, we obtained that the calculation formula of scattering in- tensity I,, Qxa and Qabs, And we calculated scattering characteristics of SiC particle in the abnormal dis- persion region under different refractive index mediums. The results show that with the increasement of mediums refractive index, the peak position of scattering intensity moves towards the direction of larger wavelength and the peak value of scattering intensity increases ~ the peak position of Qxu, and Qd,, move to- wards the direction of larger wavelength and the peak values of Qxa and Qabs decrease in the abnormal dis- persion region. These could provide theoretical reference for the optical theory, experiment and applica- tion in the abnormal dispersion region.

关 键 词：反常色散 MIE散射 散射强度 光学截面 SiC 

分 类 号：O433.4[机械工程—光学工程]