利用多馈源激励改善混响室的场均匀性  

Improving field uniformity in reverberation chamber with multiple sources

作　　者：李爽[1] 王建国[1] 谢海燕[1] 陆希成[1] 

机构地区：[1]西北核技术研究所,西安710024

出　　处：《强激光与粒子束》2011年第11期3019-3023,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(60971080)

摘　　要：研究了多馈源激励对混响室内场分布的影响。根据理想封闭矩形腔体内电磁场表达式,分析了混响室内场分布的影响因素;通过对比电场的最大值、分布标准差及各向同性等统计特征,重点研究了多馈源激励对腔体内场分布的影响。研究结果表明:采用多馈源激励可以有效地提高场均匀性,有利于构造均匀的电磁场环境。同时也证明了利用该方法在混响室中研究高功率微波效应的可行性。This paper studies the method of source stirring,especially using multiple sources to improve the field uniformity in reverberation chambers（RCs）.Firstly,the factors that may affect the field distribution in RCs are summarized,according to the Maxwell＇s equations in ideal rectangular resonators.Then the focus is on the effects of multiple sources on the electromagnetic field distributions in RCs,including the maximum and the standard deviation of electric field strength and the isotropy as well.The results show that multiple sources can improve the field uniformity effectively and are useful in constructing a homogenous electromagnetic field environment for high-power microwave effect test on subsystems.

关 键 词：混响室 高功率微波 源搅拌 场均匀性 

分 类 号：O441.4[理学—电磁学]