薄片位置对杨氏干涉图样的影响  

Chip Superimposed on the Young Position Impact

作　　者：吴冬英[1] 岳莉[1] 

机构地区：[1]凯里学院理学院,贵州凯里556011

出　　处：《凯里学院学报》2011年第6期25-27,共3页Journal of Kaili University

摘　　要：根据光的干涉理论,计算杨氏干涉实验中在S2缝前加透明介质薄片和在S2缝后加透明介质薄片对干涉图样的影响,从而指出姚启钧所著的由高等教育出版社出版的第4版《光学教程》教材中的错误,并提出修改的建议.According to the light interference theory,calculation in young＇s interference experiment with transparent medium before thin seam in sewing with transparent before and after the medium slice of interference pattern influence.There by higher education press.Yao QiJun pointed out the mistakes in the teaching material of optical tutorials,and puts forward the suggestion.

关 键 词：光的干涉 杨氏实验 薄片 

分 类 号：O436.1[机械工程—光学工程]