热处理对氧化铈粉体3～5μm波段红外发射率的影响  

Effects of Heat Treatment on the Infrared Emissivity of Cerium Oxide in 3-5 m Waveband

作　　者：蒋勇[1] 徐国跃[1] 郭腾超[1] 李泉灵[1] 秦锐[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,江苏南京211100

出　　处：《红外技术》2011年第12期699-703,共5页Infrared Technology

基　　金：国防科研计划项目;国家重点基础研究发展计划(973计划)资助项目(编号:xxxxx03zt2-06-ZZT2);国家自然科学基金资助项目(编号:90505008);航空基金项目(编号:2009ZA52013);南京航空航天大学专项科研基金(编号:1006-56XHA09002)

摘　　要：在600℃以内,氧化铈粉体在3～5μm波段的红外发射率随着测试温度的升高而降低。通过设计关于热处理的正交实验和单因素实验,发现采用以4℃/min的升温速率升至1300℃保温4h后,氧化铈粉体在常温下的发射率最低,可降至0.37;测试温度升至600℃时,发射率则可降至0.3,可以考虑作为发动机用红外低发射率耐高温涂层的填料。通过XRD、SEM等表征手段,分析了热处理引起发射率变化的原因。The infrared emissivity of cerium oxide in 3-5 μm waveband is decreased with the rising of the testing temperature at a range of 600℃. According to orthogonal and single factor experiments, different heat treatment techniques were used to treat the cerium oxide powder. While the powder was heated to 1300℃ at the rate of 4℃/min and kept at this temperature for 4h, the infrared emissivity of cerium oxide at room temperature can reach 0.37. The corresponding infrared emissivity at 600℃ was reduced to 0.30. This powder can be used as the pigment of infrared stealth coating. The reason of the change of infrared emissivity after heat treatment was analyzed by characterization methods of XRD, SEM et al.

关 键 词：氧化铈 热处理 红外发射率 正交实验 

分 类 号：TQ325.12[化学工程—合成树脂塑料工业] TN976[电子电信—信号与信息处理]