钨等离子体平均离化度研究  

Study on mean ionization state for tungsten plasma

作　　者：黄华[1] 姜明[1] 马波[1] 吴双[1] 杨志坚[1] 苟富均 

机构地区：[1]西南民族大学电气信息工程学院,成都610041 [2]荷兰皇家科学院等离子体物理研究所

出　　处：《核聚变与等离子体物理》2011年第4期327-331,共5页Nuclear Fusion and Plasma Physics

基　　金：国家自然科学基金资助项目(10676025);国家外专局2010年度外国文教专家重点资助项目(Z-2010-14)

摘　　要：用SHML模型计算了在局域热力学平衡条件下钨等离子体在温度为0．3～10keV、密度为0．001～O．1g·cm-3范围内的平均离化度，研究了钨等离子体平均离化度随温度、密度的变化规律。结果表明，钨等离子体的平均离化度随着密度的增加而减小，随着温度的升高而增大，并且在增大的过程中出现了三个平台。研究了电离势对离化度的影响，解释了出现平台的原因。Under the local thermodynamics equilibrium condition, the mean ionization state about tungsten plasma is calculated by SHML model with temperatures in the range of 0.3keV to 10keV and density in the range of 0.001g-cm-3 to 0.1g-cm-3. It is studied that the mean ionization state for tungsten plasma is related to temperature and density. The results show that Wu ionization is reducing as the increase of density, but increasing as the rise of temperature. And the mean ionization state for tungsten plasmas appears three steps in graph as the rise of temperature. This article researches the relationship between ionization state and ionization potential, and explains why steps appear.

关 键 词：钨等离子体 平均离化度 电离势 

分 类 号：O571[理学—粒子物理与原子核物理]