高反射镜膜层应力耦合研究  

Matching the residual stress between thin films for high reflective mirrors

作　　者：胡江川[1] 蔡红梅[1] 陈松林[1] 邱服民[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610041

出　　处：《红外与激光工程》2011年第12期2447-2450,共4页Infrared and Laser Engineering

基　　金：NSAF基金

摘　　要：为了控制高损伤阈值高反射镜膜层的应力,研究了沉积过程中沉积倾角、充氧量对高、低折射率单层膜应力大小的影响。研究发现这两个参数对控制薄膜应力有很大影响,SiO2薄膜在沉积倾角较小和充氧量增大时应力都逐渐减小,SiO2薄膜应力为压应力;HfO2薄膜在充氧量增大时薄膜应力变小,HfO2薄膜应力为张应力。因此,根据SiO2和HfO2薄膜的应力特性,调整镀膜工艺,实现了高、低折射率膜层之间的应力匹配,控制了反射镜面形;同时,镀制的高反射镜满足高功率激光器损伤阈值的要求。In order to reduce the residual stress of the high reflective and high laser induced damage mirrors,the effects of coating parameters on the stress of silica dioxide coating and hafnia coating were studied,which were the angle of substrate holder,oxygen partial pressure during deposition.The experimental study shows that the two parameters have very important influence on the stress.The stress of the SiO2 film was reduced when the angle of the deposition was reduced and the oxygenation was increased,and the stress of the SiO2 film was compressive stress.The stress of the HfO2 film was reduced when the oxygenation was increased,and the stress of the HfO2 film was tensile stress.According to the stress characters of silica dioxide coating and hafnia coating,the stresses are matched in the high reflection mirrors and the profiles of mirrors are controlled by adjusting the processing technology.In this deposition technology,the high reflection mirrors also have high laser induced damage thresholds which meet the imposed requirement from high-power laser specifications.

关 键 词：剩余应力 充氧量 沉积倾角 

分 类 号：O484.5[理学—固体物理]