RB-SiC高致密、超光滑SiC表面改性涂层的制备  

Preparation of High Compact and Super-smooth SiC Surface Modification Coating on RB-SiC Mirror

作　　者：苑永涛[1] 刘红[1] 陈益超[1] 敬畏 宋宁[1] 方敬忠[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《航天返回与遥感》2011年第6期74-77,共4页Spacecraft Recovery & Remote Sensing

基　　金：领域前沿部署课题(C09K007)

摘　　要：为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径80mm的RB-SiC基片上沉积了厚约60μm的SiC致密改性涂层,使用传统机械抛光方法对改性层进行超光滑加工,并测试了改性前后的表面粗糙度。结果表明,抛光后SiC表面改性RB-SiC反射镜表面粗糙度均方根(rms)值达到了0.316nm,获得了具有较高光学表面质量的超光滑RB-SiC材料。In order to manufacture RB-SiC mirrors of fine optical surface, 601zm thick SiC coating was prepared by RF magnetron sputtering on RB-SiC substrate of 80mm diameter and then polished.Tests with ZYGO surface profilometer show that the surface roughness rms of the surface-modified RB-SiC achieves 0.316nm. Therefore, the magnetron sputtered SiC coating can satisfy the requirements of RB-SiC surface modification.

关 键 词：反应烧结碳化硅 射频磁控溅射 表面改性 材料制备 光学反射镜 

分 类 号：O484[理学—固体物理]