单晶硅电火花铣削电极表面覆盖效应研究  

Study on Electrode Covering Effect on Monocrystalline Silicon in Electrical Discharge Milling

作　　者：刘志东[1] 鲁清[1] 邱明波[1] 田宗军[1] 黄因慧[1] 

机构地区：[1]南京航空航天大学,南京210016

出　　处：《中国机械工程》2012年第2期208-211,共4页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(50975142);江苏省科技支撑计划资助项目(BE2009161);江苏省博士后基金资助项目(1002009C)

摘　　要：对单晶硅电火花铣削过程中电极表面出现的覆盖层进行了分析,分析结果表明,该覆盖层的主要成分是SiO2。实验证明,SiO2是加工过程中电化学反应的产物。研究了电参数对SiO2覆盖层厚度的影响规律。研究结果表明,可以通过控制SiO2覆盖层的厚度来保护电极和补偿电极损耗,实现低损耗甚至无损耗的单晶硅电火花铣削加工。Electrode covering effect on monocrystalline silicon in electrical discharge milling was analyzed and the covering material was SiO2. The SiO2 cover was proved to be generated from some electrochemical reactions during the process. The effects of electrical parameters on the covering thickness were researched, and electrical discharge milling of low or even no electrode wear can be realized by controlling the covering thickness to compensate for electrode wear.

关 键 词：单晶硅 电火花铣削 电极损耗 覆盖效应 

分 类 号：TG662[金属学及工艺—金属切削加工及机床]