[NiFe/Cu/Co/Cu]_n纳米多层线的电化学制备及表征  

Electrochemical Preparation and Characterization of [NiFe/Cu/Co/Cu]_n Multilayered Nanowires

作　　者：张卫国[1] 谢仁鑫[1] 王宏智[1] 姚素薇[1] 

机构地区：[1]天津大学化工学院杉山表面技术研究室,天津300072

出　　处：《化学学报》2012年第1期1-5,共5页Acta Chimica Sinica

基　　金：天津市自然科学基金重点(No.G08JCZDJC17400)资助项目~~

摘　　要：采用电沉积法,在阳极氧化铝(AAO)模板中制备了[NiFe/Cu/Co/Cu]n多层纳米线.利用扫描电子显微镜(SEM)及透射电子显微镜(TEM)对纳米多层线的表面形貌及结构进行了表征,纳米线阵列高度有序、直径均一、层状结构清晰,NiFe层厚度约40 nm,Cu层厚度约60 nm,Co层厚度约15 nm,各子层厚度可控.利用X射线能谱分析仪(EDS)对纳米多层线NiFe层的成分进行了测试,Ni,Fe的原子比为4∶1.利用X射线衍射仪(XRD)对[NiFe/Cu/Co/Cu]n纳米多层膜和多层线结构进行了测试,多层膜为面心立方(fcc)结构,多层线NiFe层为面心立方(fcc)结构,Cu层为六方密排hcp(100),Co层为面心立方(fcc)结构.与组成、结构完全相同的多层膜相比,[NiFe/Cu/Co/Cu]n多层纳米线具有更优越的巨磁电阻性能.[NiFe/Cu/Co/Cu]n multilayered nanowires was electrodeposited into the pores of an anodic alu-minum oxide（AAO） template by the union of single bath and dual bath method.Scanning electronic mi-croscopy（SEM） and transmission electron microscopy（TEM） were used to characterize the morphology and multilayered structure of multilayered nanowires.The results show that the layer thicknesses are very uni-form and the multilayered structure is clear and regular.The thickness of NiFe,Cu and Co segment is about 40,60 and 15 nm respectively.The multilayered nanowires array is highly ordered.Energy dispersive X-ray spectroscopy（EDS） was used to characterize the components of multilayered nanowires.The results show that the atomic ratio of Ni to Fe is 4∶1.X-ray diffraction was used to characterize the structure of multilay-ered films and multilayered nanowires.The results show that multilayered films is face-centered-cubic（fcc）,NiFe layer of multilayered nanowires is face-centered-cubic（fcc）,Cu layer is hexagonal closed-packed hcp（100）,Co layer is face-centered-cubic（fcc）.With the same composition and structure,[NiFe/Cu/Co/Cu]n multilayered nanowires has a more superior performance of giant magnetoresistance than multilayered films.

关 键 词：[NiFe/Cu/Co/Cu]n 纳米多层线 电化学 表征 

分 类 号：TB383.1[一般工业技术—材料科学与工程]