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机构地区:[1]上海理工大学光电与计算机学院,上海200093
出 处:《电源技术》2012年第1期118-120,共3页Chinese Journal of Power Sources
基 金:上海市教育委员会科研创新项目基金(5310302201)
摘 要:阐述用于EUV光刻技术的脉冲功率电源的设计。该脉冲电源由充电电容组,半导体开关(IGBT),脉冲变压器和四级磁压缩回路组成。解释磁开关的工作原理,提供各关键元件的设计参数。根据磁性材料的物理特性参数,利用Pspice仿真软件建立磁芯模型,构建磁开关和仿真电路,对各级电压和电流波形进行分析,进而设计调整各级磁开关的参数。实验结果表明,该脉冲电源输出峰值为30 kV,上升沿为<85 ns,脉冲宽度<100 ns的脉冲信号。The design of a pulsed power generator for microlithography to discharge produced plasma(DPP) EUV light source was expatiated in this paper.This power consisted of a charger a capacitor bank,a semi-conductor switch(IGBT),a pulse transformer and 4-staged magnetic pulse compression circuit.The working principle of magnetic switch was introduced,and the design parameters of the key components were provided.Based on the physical properties of the magnetic materials,Pspice simulation software was used to establish the core model and MPC,all levels of the voltages and currents waveforms were analyzed,and then the levels of the design parameters of the magnetic switch were adjusted.The experiment results show that,the output peak voltage of the pulsed power is 30 kV,the rise time is less than 85 ns and the pulse width is under 100 ns.
分 类 号:TM154.2[电气工程—电工理论与新技术]
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