脉冲激光沉积法制备Zn_(1-x)Cd_xO薄膜及结构和光学性能研究  

Preparatio of Zn_(1-x)Cd_xO Thin Films by Pulsed-Laser Deposition Method and Its Structure and Optical Properties

作　　者：邢伯阳[1] 牛世峰[2] 

机构地区：[1]北京理工大学材料学院,北京100081 [2]吉林大学交通学院,长春130022

出　　处：《长春理工大学学报（自然科学版）》2011年第4期94-96,117,共4页Journal of Changchun University of Science and Technology(Natural Science Edition)

摘　　要：采用脉冲沉积(PLD)法在石英玻璃衬底上制备了Zn1-xCdxO薄膜,X射线衍射仪(XRD)结果表明,所制备的Zn1-xCdxO薄膜具有与ZnO同样的六角纤锌矿结构,且薄膜具有沿着(002)晶面择优取向生长特征,随着Cd掺杂浓度(x)的增加,衍射峰(002)向小角度方向移动,晶格常数增加。光致发光光谱表明Zn1-xCdxO薄膜随着Cd的掺杂浓度的增加使光学带隙逐渐变窄了,且控制掺入量就可以实现ZnO薄膜禁带宽度在一定范围内连续可调。Zn1-xCdxO thin films were prepared on quartz glass substrates by Pulsed-Laser Deposition（PLD） method.Zn1-xCdxO films showed a hexagonal wurtzite structure and c-axis orientation as observed by XRD.The peak positi on of the（002） plane shifted to the low angle value with the increase of Cd doping.All the samples show two distinct emissions：a peak in the UV region and a broad deep level peak in visible light region.the violet emission peak has a red shift to region of lower photon energy as the concentrati on of the Cd increases.It was practicable to reduce optical bandgap of the thin films by Cd-doped ZnO.

关 键 词：Cd掺杂ZnO 光学性能 红移 

分 类 号：TB31[一般工业技术—材料科学与工程]