T91钢表面复合电沉积Ni/CrAl镀层的工艺研究  

Preparation of Ni/CrAl Coatings on T91 Steel by Composite Electrodeposition

作　　者：刘光明[1] 刘德强[1] 汪元奎 任永峰[3] 邱佳红 田继红[1] 

机构地区：[1]南昌航空大学材料科学与工程学院,南昌330063 [2]东方锅炉集团有限公司材料研究所,自贡643001 [3]宝鸡石油钢管有限责任公司钢管研究院,宝鸡721008

出　　处：《表面技术》2012年第1期61-63,共3页Surface Technology

基　　金：国家自然科学基金(51161022)

摘　　要：采用复合电沉积法在T91钢表面制备Ni/CrAl镀层,研究了CrAl微粒在镀层中的含量与搅拌强度、镀液pH值、电流密度及温度的关系,确定最佳工艺参数为:电流密度2.5～4.5A/dm2,pH值4～4.5,温度30℃。采用该工艺制备了较高CrAl含量的复合镀层,并对工艺参数影响复合电沉积的机理进行了简单探讨。Ni/CrAl coating was prepared on T91 steel by composite electrodeposition process. The relationship between CrAl content in coating and stirring intensity, currnt density, pH as well as temperatures were studied in Watts solution. The optimum process of composite electrodeposition of Ni/CrAl composite coating was obtained as follows： current density was 2.5-4.5 A/dinz , the temperature was held at 30℃ and pH was 4-4.5. According to this electrodeposition process high content CrAl c＇oating was obtained. The mechanism of electrodepostion affected by process parameter was discussed in brief.

关 键 词：复合电沉积 Ni/CrAl 镀层 

分 类 号：TQ153.1[化学工程—电化学工业]