双频容性耦合等离子体密度径向均匀性研究  

Radial density uniformity of dual frequency capacitively coupled plasma

作　　者：蒋相站[1,2] 刘永新[1] 毕振华[1] 陆文琪[1] 王友年[1] 

机构地区：[1]大连理工大学物理与光电工程学院,大连116024 [2]新疆工业高等专科学校,乌鲁木齐830091

出　　处：《物理学报》2012年第1期276-282,共7页Acta Physica Sinica

基　　金：国家自然科学基金重点项目(批准号:10635010)资助的课题~~

摘　　要：利用自主研制的全悬浮双探针,对影响双频容性耦合等离子体径向均匀性的因素进行了研究.发现低频功率、放电气压和放电间距对径向均匀性有明显影响.合适的低频功率、放电气压及较大的极板间距可以得到更均匀的等离子体.采用与实验相同的放电参数,利用改进的二维流体模型进行理论模拟,得到了不同极板问距下径向离子密度分布,并和实验测量结果进行了比较,两者的变化趋势基本符合.The influences on dual frequency capacitively coupled plasma radial uniformity are studied with a newly developed complete floating double probe.It is found that low frequency power,discharge pressure and gap have significant effects on radial uniformity. The results show that a suitable low frequency power,discharge pressure and larger discharge gap can achieve more uniform plasma. Finally,the improved two-dimensional fluid model simulations are performed with the same discharge parameters in experiment.The radial ion density distributions are obtained for different discharge gaps.The results are almost consistent with each other.

关 键 词：双频容性耦合等离子体 径向均匀性 全悬浮双探针 二维流体模型 

分 类 号：TN305[电子电信—物理电子学] O539[理学—等离子体物理]