席夫碱自组装膜对铜缓蚀性能的研究  

Corrosion Inhibition of Copper by a Self-assembled Monolayer of Schiff Base

作　　者：钱建华[1] 张蕾[1] 刘琳[1] 王晓旭 

机构地区：[1]渤海大学,辽宁省功能化合物的合成与应用重点实验室,锦州121013 [2]新疆独山子石化乙烯聚丙烯车间,独山子833600

出　　处：《科学技术与工程》2012年第3期642-643,653,共3页Science Technology and Engineering

基　　金：辽宁省自然科学基金(201102001);辽宁省科技厅重点实验室(2008403001)资助

摘　　要：合成了双水杨醛缩邻苯二胺席夫碱,在铜片表面制备了席夫碱的自组装分子膜。利用电化学工作站分析了席夫碱自组装膜对铜片的缓蚀效果,利用金相显微镜观察1 mol/L HCl腐蚀后铜片表面形貌。结果表明:双水杨醛缩邻苯二胺席夫碱对铜有一定的缓蚀效果,自组装膜在1 mol/L的盐酸溶液中缓蚀效率达到85.3%。自组装膜的缓蚀效率与浓度有关,浓度高的自组装膜对铜片的缓蚀作用明显高于低浓度的自组装膜。N,N＇-bis（salicylidene）-o-phenylenediamine schiff base was synthesized,and the self-assembled monolayer of schiff base was formed on copper surface.Electrochemical workstation was used to analyze the schiff base films for the copper＇s corrosion inhibition performance.The corrosion of copper in 1 mol/L HCl solution was observed by metallography microscope.The results indicate that self-assmbled monolayer has a corrosion inhibition performance on copper.The self-assembled monolayer inhibition efficiency reaches 85.3% in 1 mol/L HCl solution.The corrosion inhibition efficiency is related with concentration.The high concentration of self-assembled monolayer on copper corrosion inhibition is significantly better than the low.

关 键 词：席夫碱 自组装 电化学 防腐蚀 

分 类 号：O632.34[理学—高分子化学]