AISI 304不锈钢表面Fe_3Si型硅化物渗层的制备及渗硅机理  

Preparation and siliconizing mechanism of Fe_3Si type silicide layer deposited on AISI 304 stainless steel

作　　者：安亮[1,2] 贾建刚[1] 马勤[1] 李鹏[1] 

机构地区：[1]兰州理工大学甘肃省有色金属新材料省部共建国家重点实验室,兰州730050 [2]兰州工业高等专科学校材料工程系,兰州730050

出　　处：《中国有色金属学报》2011年第12期3064-3070,共7页The Chinese Journal of Nonferrous Metals

基　　金：国家自然科学基金资助项目(51001057)

摘　　要：以n(NaCl):n(KCl):n(NaF)=2:2:1碱金属卤化物混合体系做载体,采用不同摩尔比的Na2SiF6和Si粉作渗硅剂,在800℃下利用熔融盐法分别对AISI 304不锈钢进行渗硅处理。采用X射线衍射仪(XRD)分析渗硅层的物相组成,用附带能量色散谱仪(EDS)附件的扫描电子显微镜(SEM)研究渗层截面的形貌和成分,分析熔盐法渗硅层的形成机理。结果表明:融盐中SiF62-的浓度决定渗层中Si元素的含量,由于SiO2在融盐体系中的溶解,融盐中SiF62-得到补充,渗层中Si元素的含量进一步提高。The silicide layers deposited on the AISI 304 stainless steel were formed in the molten salts at 800 ℃ using the molten mixture of different mole ratios of Na2SiF6 to Si using the siliconizing agent and the molten halogenide of alkali metals of NaCI＋KCI＋NaF at mole ratio of 2：2：1 as the siliconizing agent carrier. In order to reveal the siliconizing mechanism in the molten salts, the phase of the silicide layer was analyzed by X-ray diffractometry. Meanwhile, the micrographs and the composition of the cross section of the silicide layer were studied by scanning electron microscopy （SEM） attached with energy dispersive X-ray spectrometer （EDS）. The results show that the silicon content in the layer depends on the ion concentration of SiF62- in the molten salts. The dissolving of SiO2 in the molten salts supplies the SiF62- continuously and as a result, the silicon content in the layer is enhanced.

关 键 词：AISI 304不锈钢 FE3SI 硅化物渗层 渗硅机理 渗硅体系 

分 类 号：TG156.8[金属学及工艺—热处理]