酸化破乳-Fenton试剂氧化-混凝沉淀处理电子感光废水的研究  

Study on Treatment of Electronic Photosensitive Wastewater with Acidification Demulsification-Fenton Reagent Oxidation Coagulating Deposition

作　　者：李义久[1] 钱君律[1] 马前[1] 刘宏[1] 宋卫锋[1] 倪亚明[1] 

机构地区：[1]同济大学化学系污染控制与资源化国家重点实验室,上海200092

出　　处：《上海化工》2000年第1期26-28,共3页Shanghai Chemical Industry

摘　　要：用酸化破乳－Ｈ２Ｏ２／ Ｆｅ２＋氧化－混凝沉淀处理印刷线路板感光乳化废水。讨论了 ｐＨ值、Ｈ２Ｏ２的浓度、Ｆｅ２浓度对ＣＯＤ去除的影响。结果表明，酸化破乳、Ｆｅｎｔｏｎ试剂氧化的ｐＨ值控制在３～４，混凝沉淀ｐＨ值控制在９～１０，Ｈ２Ｏ２浓度为０．０６ｍｇ·Ｌ－１，Ｆｅ２＋浓度为０．８ｍｇ·Ｌ－１，反应温度为１４０℃左右时，ＣＯＤ总去除率达９３．６％，具有良好的应用前景。Description of treating mixed photosensitive wastewater from the printed circuit board plant with acidification demulsification-Fenton reagent oxidation-coagulating deposition was presented. Influence of pH. Fe2+ H2O2 on removing COD was discussed .The results showed that total removed at of COD reached 93.6% when pH in acidification demulsilication and Fenton reagent oxidation was 3-4, pH in coagulating deposition was 9-10,the concentration of H2O2 was 0.06mg· L-1,the concentration of Fe2+ was 0. 8mg· L-1. This technology will be being applied.

关 键 词：酸化破乳 氧化 混凝沉淀 废水处理 电子工业 

分 类 号：X76[环境科学与工程—环境工程]