铬过渡层位置及金属沉积角度对纳米球刻蚀法制备二维银纳米点阵结构的影响  

Effect of Cr position and metal deposition direction on two-dimensional Ag nanoparticle array structure during nanosphere lithography

作　　者：孔令琦[1,2] 张春婧[1,2] 黄胜利[2] 朱贤方[2,3] 

机构地区：[1]厦门大学材料学院生物材料系和厦门大学中国-澳大利亚功能纳米材料联合实验室,厦门361005 [2]厦门大学物理系和厦门大学中国-澳大利亚功能纳米材料联合实验室,厦门361005 [3]ARC Centre of Excellence for Functional Nanomaterials, University of Queensland, St Lucia, Brisbone, Queensland 4072, Australia

出　　处：《物理学报》2012年第3期322-329,共8页Acta Physica Sinica

基　　金：国家科技计划国际科技合作与交流专项(批准号:2008DFA51230);国家重点基础研究发展计划(973计划)(批准号:2007CB936603);国家自然科学基金(批准号:60776007,11074207);教育部高等学校博士学科点专项科研基金(批准号:20100121110023)资助的课题~~

摘　　要：利用纳米球刻蚀法制备了二维六角密排三角形银纳米阵列,通过加入铬过渡层并改变其位置和改变金属沉积角度,研究它们对点阵结构的影响.实验发现,加入铬过渡层所形成的银纳米点阵结构较无铬层有很大改善,三角形角部更加尖锐,更能满足传感器对信号检测的要求.同时,该过渡层应蒸镀在模板球排列之后,才能获取更大面积的二维银纳米点阵结构.在沉积角度对制备二维银纳米点阵的影响的实验中,基片没有旋转,采用垂直镀膜方式更容易得到结构完整、结合较牢固、且面积较大、角部尖锐的二维银纳米点阵.吸收光谱测量进一步验证了铬过渡层对二维银纳米点阵形貌结构的改善作用.这些为下一步的生物修饰以及生物化学传感器的制备提供了先决条件.Ag nanoparticles with two-dimensional（2D） array structure are fabricated via nanosphere lithography.The influences of Cr interlayer position and metal deposition direction on array structure are systematically studied.It is found that the structure of the 2D Ag nanoparticle array with Cr interlayer is better than that without interlayers.When the Cr interlayer is deposited on the PS mask, the tips of the acquired triangle nanoparticles are much sharper,and the area of the nanoparticle array is much larger than that in the other case.Moreover,the achieved nanoparticle array has a better uniformity and compactness in structure,and a higher binding ability to the substrate when Cr and Ag deposition direction are perpendicular to the surface of the substrate.Further absorption spectrum experiment proves the improvement of the structure and feature of the 2D Ag nanoparticle array.All these results are very crucial to the future modification and fabrication of biochemical sensors with the 2D Ag nanoparticle array.

关 键 词：纳米球刻蚀 铬过渡层 沉积角度 吸收光谱 

分 类 号：TB383.1[一般工业技术—材料科学与工程]