三氯氢硅精馏过程的模拟与优化  

Simulation and optimization of the trichlorosilane distillation process

作　　者：李群生[1] 白洁[1] 郭增昌 王宝华[3] 

机构地区：[1]北京化工大学化学工程学院,北京100029 [2]特变电工新疆硅业有限公司,新疆乌鲁木齐830011 [3]北京中医药大学中药学院,北京100029

出　　处：《北京化工大学学报（自然科学版）》2012年第1期1-5,共5页Journal of Beijing University of Chemical Technology(Natural Science Edition)

基　　金：国家"973"计划(2007CB714304)

摘　　要：采用化工流程模拟软件,对三氯氢硅精馏的双塔流程进行了模拟计算,在产品质量达到工艺要求的基础上,对精馏过程各塔的主要参数进行了分析优化。计算得到预分离塔的最适宜进料板位置、回流比、塔顶采出量分别为6、18、250kg/h,三氯氢硅塔的最适宜进料板位置、回流比、塔顶采出量分别为12、5、2453kg/h,并且最适宜的进料温度范围为25～35℃。将优化后的参数应用到实际设计和生产中,三氯氢硅塔塔顶产品各组分含量的模拟结果与工业数据基本一致,三氯氢硅纯度大于0.999。A two-tower process for trichlorosilane distillation has been modeled using chemical process simulation software.Using the quality of the products as the criterion,the parameters of each tower were analyzed and optimized.For the pre-tower,the optimized feed location,reflux ratio and the amount of distillate were 6,18 and 250 kg/h,respectively,while the optimized feed location,reflux ratio and the amount of distillate in the trichlorosilane tower were 12,5 and 2453 kg/h,respectively.The appropriate feed temperature was found to be 25-35 ℃.These parameters were employed in practical design and production,which showed the simulated results of the composition of the overhead product of the trichlorosilane tower approximately agreed with the industrial data.The purity of trichlorosilane was greater than 99.9%.

关 键 词：三氯氢硅 精馏 模拟优化 工业应用 

分 类 号：TQ028.4[化学工程]