多层四面体非晶碳膜的热稳定性  

Thermal stability of multilayer tetrahedral amorphous carbon films

作　　者：韩潇[1] 朱嘉琦[2] 周峰[1] 陈晓丽[1] 

机构地区：[1]北京空间机电研究所,北京100076 [2]哈尔滨工业大学航天学院,黑龙江哈尔滨150080

出　　处：《红外与激光工程》2012年第1期144-148,共5页Infrared and Laser Engineering

基　　金：国家自然科学基金(50602012)

摘　　要：为了获得具有一定厚度的四面体非晶碳薄膜,利用过滤阴极真空电弧(FCVA)沉积技术,通过交替改变衬底偏压的方法制备了多层四面体非晶碳(ta-C)薄膜。多层膜由富sp2子膜层Ai与富sp3子膜层Bi交替组成(i=1,2,3),各子膜层厚度比dAi/dBi约为1.0,总的膜厚约为1μm。根据Stoney公式计算多层膜的各子膜层压应力呈交替起伏变化。多层四面体非晶碳膜在500℃以下的真空退火处理后,可见光Raman谱表明,多层膜的富sp3杂化结构基本保持不变,纳米压痕测量的薄膜硬度与杨氏模量略微增加,纳米划擦实验表明,多层膜具有优良的耐磨性与附着性。因此,多层ta-C膜具有优良的力学性能和热稳定性,是一种优异的航空航天用光学元件的表面保护膜。Using the filtered cathodic vacuum arc（FCVA） deposition technique with a process of changing substrate bias,a stable thick multilayer ta-C film was prepared.The multilayer films with a good adhesion consisted of alternating sp2-rich sublayers Ai and sp3-rich sublayers Bi（i=1,2,3）.The sublayers thickness ratio dAi/dBi was about 1.0,and the total thickness of the multilayer film was about 1 μm.The calculated compressive stress of sublayers by the Stoney formula revealed an alternating wave change.After anealling at 500 ℃ in vacuum,the Raman spectra suggested the multilayer film had a non-changed sp3-rich microstructure.The nanoindentation measurement showed an increasing hardness and Young′s modulus of the multilayer film after annealing.The nanoscratch test showed the favourable scratch resistance and adhesive properties of multilayer film.The results indicate that the multilayer ta-C film has some excellent mechanical properties and thermal stability.The multilayer film is proper for the optical protective coatings for aeronautics and space applications.

关 键 词：非晶碳 多层膜 残余应力 热稳定性 

分 类 号：TB43[一般工业技术] TN21[电子电信—物理电子学]