聚甲基硅氧烷纳米多孔薄膜的微孔结构分析  

Pore Structural Analysis on Poly(Methyl) silsesquioxane Porous Thin Films by Synchrotron Radiation Small Angle X-ray Scattering

作　　者：高芳亮[1] 李生英[1] 陈宏基[1] 吴忠华[2] 李志宏[2] 

机构地区：[1]暨南大学理工学院材料科学与工程系,广州510632 [2]中国科学院高能物理研究所同步辐射国家实验室,北京100049

出　　处：《材料研究学报》2012年第1期68-72,共5页Chinese Journal of Materials Research

摘　　要：用旋涂工艺和致孔法制备了一组聚甲基硅氧烷纳米多孔薄膜,用红外吸收光谱(FT-IR)、热重分析(TGA)对其进行表征,用同步辐射光源进行小角X射线散射测试,在掠入射模式(GISAXS)下进行微孔结构分析。结果表明,聚甲基硅氧烷前驱体与致孔剂具有良好的相容性;薄膜的小角散射曲线均不遵守Porod定理、形成正偏离;所有纳米多孔薄膜具备孔分形特征;薄膜基体与孔结构之间存在微电子密度起伏,且薄膜孔径小于3 nm。A group of poly（methyl）silsesquioxane nanoporous thin films were prepared by poregenerating and spin-coating processes. The nanoporous thin films were characterized using Fourier trans- form infrared spectroscopy （FT-IR） and thermogravimetric analyzer （TGA）. And their scattering profiles and scattering intensities of the group of samples with different porosity were obtained by small angle X-ray scattering （SAXS） in grazing incidence （GISAXS） mode. The results show that there is a good compatibility between the poly（methyl）silsesquioxane precursor and porogen. The films exhibit pore fractal characteristics with disagreement with Porod＇s law and give out positive deviation, and the micro-density fluctuations between film substrate and pore structure existed in the system, having a maximum 3 nm of pore radius for the group of poly（methyl）silsesquioxane nanoporous thin films.

关 键 词：有机高分子材料 聚甲基硅氧烷 掠入射小角X射线散射 纳米多孔薄膜 孔结构 

分 类 号：TB324[一般工业技术—材料科学与工程]