超光谱成像光学设计  

Optical design of hyperspectral imager

作　　者：计卓馨[1] 刘智颖[1] 付跃刚[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《应用光学》2012年第1期26-29,共4页Journal of Applied Optics

摘　　要：针对超光谱成像涉及光学、光谱学、机械、微电子、计算机等众多研究领域,成像光谱仪需要小型化设计的要求,设计一个超光谱复消色差的成像系统。从像差理论出发,依据典型的光学玻璃在400nm～1 000nm波段的色散特性,导出了消二级光谱的理论公式。针对系统指标全视场7.63°,F/#为5,焦距为60mm,利用ZEMAX软件,对其二级光谱进行了校正设计。结果表明,在可见光和近红外波段,成像系统在60lp/mm处的MTF均大于0.5,其他像差也达到了要求。Hyperspectral imaging detection technology involves optics, spectroscopy, machinery, microelectronics, computer and other disciplines. The design of imaging spectrometer should be compact and apochromatic. Based on the aberration theory, theoretical formula of secondary spectrum was derived according to the dispersion characteristics of typical glass materials in 400 nm-1 000 nm. For a system with FOV of 7.63°, F/#= 5, f= 60 mm, its secondary spectrum was corrected in design with ZEMAX software. The results indicate the MTF of the imaging system is greater than 0.5 at 60 lp/mm in visible and infrared band, other aberration requirements are met as well.

关 键 词：超光谱成像 光学设计 复消色差 二级光谱 

分 类 号：TN202[电子电信—物理电子学] TH703[机械工程—仪器科学与技术]