硅油基底Ni薄膜的生长机理及微观结构研究  

Study on formation mechanism and microstructure of Ni films on silicone oil surfaces

作　　者：冯元新[1] 

机构地区：[1]浙江科技学院理学院,杭州310023

出　　处：《浙江科技学院学报》2012年第1期10-14,共5页Journal of Zhejiang University of Science and Technology

摘　　要：基于液相材料可用作薄膜生长基底的事实,采用真空热蒸发沉积方法,在硅油基底表面制备了具有近似自由支撑边界条件的镍(Ni)薄膜系统。在原子力显微镜(AFM)的观察下发现,镍分枝状凝聚体事实上是由尺寸为几十纳米且呈现高斯分布的原子颗粒组成,在一定的沉积速率下,其原子颗粒的平均直径随着薄膜名义厚度的增加而迅速减小;同时,还观察到了Ni薄膜的反常边缘效应,并对此现象做了一定的物理分析。： Based on the fact that the liquid surfaces can be used as thin films substrates, a nearly free sustained nickel film system on silicone oil surfaces is made by thermal evaporation method. The Ni aggregates exhibit a granular structure. The mean size of the granularities in the aggregates is of the order of 10 nm, and it decreases with the nominal film thickness. Anomalous edge effect of the Ni aggregates is observed, and the physical interpretation for this phenomenon is presented.

关 键 词：硅油基底 成膜机理 微观结构 反常边缘效应 

分 类 号：O484.1[理学—固体物理]