惠更斯作图法分析双折射中e光的反常现象  

Analysis of the abnormal phenomena of extraordinary light in birefringence by using the Huygens construction

作　　者：张小宇[1] 张帆[1] 

机构地区：[1]北京大学生命科学学院,北京100871

出　　处：《大学物理》2012年第1期54-57,F0003,共5页College Physics

摘　　要：在单轴晶体双折射中,e光会发生一些反常的折射现象如负折射、e光离散角、全反射现象等.与文献中普遍所采用的基于平面光波在晶体中传播的电磁理论特性求解的过程不同,本文则以更为直观的惠更斯作图法为出发点,利用几何求解,得出负反射临界角、e光离散角、全反射临界角,并加以说明和讨论.When birefringence happens in the uniaxial crystals, some abnormal phenomena of the extraordinary light may occur, such as negative refraction, walk-off angle, total reflection and so on. Different from the electromagnetic theory of plane waves transmission in crystals as in the references, we use the Huygens construction, which is more intuitive, with some geometric methods to calculate the critical incidence angle of negative refraction, the walk-off angle and the critical incidence angle of total reflection of the extraordinary light.

关 键 词：双折射 惠更斯作图法 负折射 e光离散角 e光全反射 

分 类 号：O436.3[机械工程—光学工程]