红外迷彩伪装对发射率要求的数值分析  

Numerical analysis of requirement of emissivity for infrared pattern painting camouflage

作　　者：刘姜伟[1,2] 时家明[1,2] 陈宗胜[1,2] 许波[1,2] 

机构地区：[1]脉冲功率激光技术国家重点实验室,安徽合肥230037 [2]红外与低温等离子体安徽省重点实验室,安徽合肥230037

出　　处：《红外与激光工程》2012年第2期442-445,共4页Infrared and Laser Engineering

基　　金：红外与低温等离子体安徽省重点实验室主任基金(201A001002D)

摘　　要：针对红外迷彩伪装涂层中发射率的取值问题建立了计算模型。推导计算了目标8~14μm的平均发射率εt对目标辐射温度TR的影响,并以4 K辐射温差作为隐身标准,计算分析了目标不同真实温度T对εt取值范围的影响以及相邻斑块发射率差值△εt与固定斑块发射率ε1、目标真实温度T的关系。所得结论对红外迷彩伪装涂层的制备具有一定的指导作用。Calculation model was put forward to solve the numeric problem that how to identify the range of the pattern painting camouflage′s emissivity.Effect of the change of 8-14 μm waveband average emissivity εt on the target′s radiation temperature TR was inferred and calculated.Based on the stealth criterion of 4 K radiation temperature difference,the range of the emissivity εt for different target′s temperature T was calculated and analyzed.The relationship of the emissivity difference Δεt of the spots adjacent to each other and the fixed spot′s emissivity ε1,the target′s temperature T was also discussed.The result shows that the conclusion plays guiding role in preparation of pattern painting camouflage.

关 键 词：红外迷彩伪装 辐射温度 发射率 辐射温差 

分 类 号：TN219[电子电信—物理电子学]