纯钛表面纳米多孔TiO_2膜的孔径分布研究  

The micropore size distribution of nano-porous TiO_2 films on pure titanium

作　　者：杨亮[1] 刘钟馨[1] 周琼[1] 曹阳[1] 

机构地区：[1]海南优势资源化工材料应用技术教育部重点实验室,硅锆钛资源综合开发与利用海南省重点实验室,海南大学材料与化工学院,海南海口570228

出　　处：《电子显微学报》2012年第1期41-46,共6页Journal of Chinese Electron Microscopy Society

基　　金：科技部国际科技合作项目(2009DFA92551);教育部重点科技项目(207091);海南省重点科技计划项目(ZDXM20100067);海南省教育厅高等学校科学研究项目(Hj2010-01);海南大学科研项目(hd09xm73)

摘　　要：本文采用微弧氧化法在纯钛表面制备多孔钛氧化膜层。室温条件下,分别采用200 V、230 V、260 V、290 V、320 V和350 V恒压模式以0.5 mol/L磷酸溶液作为电解液进行微弧氧化实验。FESEM形貌分析表明不同电压下,微弧氧化法制备出的氧化膜层均能观察到多孔结构,孔径尺寸分布随施加电压的升高而增大。随微弧氧化电压的升高,氧化膜层表面微孔的最可几孔径也随之变大。在高电压条件下制备氧化膜层表面微孔孔径的最可几分布峰变宽,低电压条件下制备氧化膜层表面微孔孔径的最可几分布峰相对较窄。通过数据拟合,恒压350 V处理样品表面孔径尺寸分布几乎保持恒值。随着微弧氧化电压的升高,样品表面微孔的数量先增大后减小,在恒压230 V处理样品表面出现最大值。并未发现孔隙率与微弧氧化处理电压之间存在必然联系。Multi-porous titanium dioxide films were produced on pure titanium plates by the micro-arc oxidation.Micro-arc oxidation was carried out at room temperature.0.5 mol/L H3PO4 was used as electrolyte.Voltage was controlled as potentiostatic mode（200 V,230 V,260 V,290 V,320 V,and 350 V）.The results show that porous titanium dioxide layers appear at each voltage value.Field Emission-Scanning Electron Microscope（FE-SEM） morphology analysis reveals that the distributions of micro-pore size increase with the increase of voltage.The most probable diameters of nano-holes on nano-porous TiO2 film become bigger with the increase of the applied voltage.The most probable distribution peak of nano-holes diameters broaden at higher applied voltage,but it is not obvious at lower applied voltage.Experimental data of 350 V is quite in line with that calculated by the fitting formula.With the increase of anodizing voltage,the quantity of nano-holes first increases and then decreases,the maximum value of which appears at 230 V.The surface porosity has no obvious relation to the applied different voltages

关 键 词：微弧氧化 孔隙率 最可几直径 最可几分布 

分 类 号：TB383.2[一般工业技术—材料科学与工程]