狭缝法合肥光源高亮度注入器发射度测量系统  

Slit-based emittance measurement system for high-brightness injector at Hefei Light Source

作　　者：王晓辉[1] 何志刚 方佳[1] 孙葆根[1] 贾启卡[1] 唐雷雷[1] 卢平[1] 罗箐[1] 

机构地区：[1]中国科学技术大学核科学技术学院,国家同步辐射实验室,合肥230029

出　　处：《强激光与粒子束》2012年第2期457-462,共6页High Power Laser and Particle Beams

基　　金：国家985基金项目(173123200402002);国家自然科学基金项目(10875117,11175173)

摘　　要：为了测量受空间电荷效应支配的发射度,合肥光源高亮度注入器采用了狭缝法进行测量,研究了基于狭缝法发射度测量系统的构成,并以实例比较了单狭缝和多狭缝在发射度测量系统中的应用。两种测量方法的结果表明:单狭缝法测量的结果更接近于模拟计算值,可有效避免子束团之间的重叠,适用范围更广。实验结果表明:在240pC电荷量情况下,合肥光源高亮度注入器仍然具有较小的归一化发射度,为(1.84±0.085)mm.mrad。In order to measure the beam emittance which is space charge dominated, a slit-based emittance measurement system is applied in Hefei Light Source （HLS）. Two types of slit masks are chosen： multi-slit one and single-slit one. Measurement results show that, single-slit based emittance measurement yields closer results to the simulation value. Moreover, single-slit based emittance measurement can avoid the overlapping between adjacent beamlets, which makes its application range wider than multi-slit technique. The experiment result shows that with the beam charge of 240 pC, normalized emittance of （1.84 ±0. 085） mm ·mrad can be achieved at HLS.

关 键 词：高亮度注入器 发射度 相空间 子束团 狭缝 

分 类 号：TL53[核科学技术—核技术及应用] TL506