铀表面非平衡磁控溅射离子镀Ti基薄膜的组织结构与腐蚀性能  

Microstructures and Corrosion Resistance of Ti-Based Films Deposited on Depleted Uranium

作　　者：朱生发[1] 刘天伟[2] 吴艳萍[1] 江帆[1] 黄河[1] 唐凯[1] 魏强[1] 

机构地区：[1]中国工程物理研究院,绵阳621900 [2]表面物理与化学重点实验室,绵阳621907

出　　处：《真空科学与技术学报》2012年第3期240-243,共4页Chinese Journal of Vacuum Science and Technology

基　　金：中国工程物理研究发展基金项目(2009B0203019)

摘　　要：金属铀的化学性质十分活泼,极易发生氧化腐蚀。本文采用磁过滤多弧离子镀在金属铀表面制备Ti过渡层,然后采用非平衡磁控溅射离子镀技术制备了Ti、TiN单层膜及Ti/TiN多层薄膜,以期改善基体的抗腐蚀性能。采用X射线衍射、极化曲线、盐雾腐蚀试验对镀层的结构、表面形貌、抗腐蚀性能进行了分析。结果表明,采用磁控溅射在金属铀表面制备一层Ti/TiN多层膜后,多层膜界面较清晰,大量的界面可终止柱状晶的生长,细化晶粒,提高镀层的致密性,有效地改善了基体的抗腐蚀性能。The Ti-based protection coatings, including Ti, TiN, and Ti/TiN multi-layers, were deposited by unbal- anced magnetron sputtering ion plating on the depleted uranium substrate pre-deposited with Ti buffer layers grown by fil- ter cathode multi-arc plating. The microstructures and electrochemical properties of the Ti-based protection coatings were characterized with X-ray diffraction, scanning electron microscopy and electrochemical probes. The preliminary results show that the Ti/TiN multilayer outperforms the films of pure Ti and TiN in the enhancement of the surface corrosion re- sistance and surface oxidation resistance of the depleted uranium, possibly because the well-defined sharp interfaces of the Ti/TiN multilayer curb the growth of columnar grains and the spreading of cracks.

关 键 词：贫铀 非平衡磁控溅射多层膜腐蚀性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]