磁控溅射工艺参数对涤纶织物表面沉积铜膜性能的影响  

Influence of Magnetron Sputtering Process Parameters on the Properties of Cu Thin Films Deposited on the Surface of Polyester Plain Weave Fabric

作　　者：孟灵灵[1,2] 魏取福[1] 黄新民[2] 许凤凤[1] 

机构地区：[1]江南大学生态纺织教育部重点实验室,无锡214122 [2]盐城工学院纺织服装学院,盐城224051

出　　处：《材料导报》2012年第6期54-57,69,共5页Materials Reports

基　　金：高等学校博士学科点专项科研基金(20090093110004)

摘　　要：在室温条件下采用射频磁控溅射法在涤纶平纹机织物表面沉积纳米Cu薄膜,借助原子力显微镜(AFM)观察镀膜前后样品表面变化。通过分别改变镀膜时间、溅射功率和气体压强,研究其对样品透光性和导电性的影响。实验结果表明,经Cu镀层处理的涤纶平纹织物对紫外光和可见光的吸收能力明显优于原样。溅射压强增加,透光性能增强,铜膜方块电阻增加,导电性能减弱;镀膜时间延长和溅射功率增加,样品透射率降低,屏蔽紫外线和可见光效果明显,在溅射时间接近15min和溅射功率增加到120W后,样品屏蔽效果不明显,铜膜方块电阻随溅射功率增加而减小,导电性能增强。The copper thin films of nano-structured were prepared on the surtace ot polyestel pxuui by RF（radio frequeney） magnetron sputtering at room temperature. The surface change of samples with and without copper films deposited was observed using AFM（atomic force microscope）. The influence on the optical and electrical property of samples was studied by changing one of sputtering process parameters such as gas pressure, coating time, sputtering power. Results of experiments show that polyester plain weave fabric with copper film coated have a good absorbency of UV light and visible light relative to the original sample. With the increase of coating pressure, optical properties of samples improves, sheet resistance of copper increases and electrical property of copper films reduces^as coating time extends and sputtering power increases, sheet resistance of copper films minishes and electrical property enhances. Samples of copper films deposited on the polyester plain weave fabric have obvious effect on shielding UV and visible light for the reduced of transmittance. As coating time approaches to 15 minutes and sputtering power rises to 120W, samples have no evident sheilding effect.

关 键 词：射频磁控溅射纳米铜膜原子力显微镜透光性导电性 

分 类 号：TS174[轻工技术与工程—纺织材料与纺织品设计]