聚二甲基硅氧烷表面改性研究进展  

Research Advances in Surface Modification of Polydimethylsiloxane

作　　者：刘冰[1] 许林[1] 类彦辉[1] 薄强龙[1] 寿崇琦[1] 

机构地区：[1]济南大学化学化工学院,山东济南250022

出　　处：《山东化工》2012年第3期56-58,63,共4页Shandong Chemical Industry

摘　　要：聚二甲基硅氧烷(PDMS)具有良好的化学稳定性和透光性,以及易加工,价格低廉等优点,广泛应用于微流控芯片领域。但是由于PDMS自身为表面高度疏水且多孔性材料,导致其对DNA、蛋白质等生物大分子具有强烈的非特异性吸附,限制了它的应用范围,需要对其进行表面修饰。PDMS表面修饰的方法众多,主要分为物理方法、化学方法两大类。概述了目前常用的几种PDMS表面修饰的方法。Polydimethylsiloxane （PDMS） is widely used in microfluidic, due to the stability, transparence, easy processing and low cost. However, is the high hydropho excellent chemical bicity and porosity of PDMS, which cause the strong adorability of biomolecule （ such as DNA, protein, etc. ） , limit its application. Commonly, the surface modification can make some improvement. Up to now, many methods have been developed on the modification of PDMS, which can be divided into physical and chemical modification. In the paper, several methods of modification were reviewed.

关 键 词：聚二甲基硅氧烷 表面改性 微流控芯片 

分 类 号：TQ314.246[化学工程—高聚物工业] O634.41[理学—高分子化学]