磁控溅射电源控制算法的优化设计  

On the Optimization Design of Control Algorithm for Magnetron Sputtering Power

作　　者：邵桂荣[1] 苏世栋[1] 杨立[1] 

机构地区：[1]运城学院物理与电子工程系,山西运城044000

出　　处：《长春师范大学学报（人文社会科学版）》2012年第3期59-62,共4页Journal of Changchun Teachers Coliege

基　　金：山西省高等学校科技开发项目(20101124);运城学院基础研究项目(JC-2009014)

摘　　要：磁控溅射电源是磁控溅射镀膜生产装置中的关键设备之一,溅射过程中的不稳定严重影响镀膜的质量,因此电源控制算法的优化设计对改善溅射过程的稳定性至关重要。本文针对大型真空镀膜设备所用电源,提出变速积分PI控制和重复控制相结合的控制方案,详细介绍了复合控制器的设计过程,MATLAB仿真验证了该方案的合理性。在实验室搭建了样机,测试和运行结果证明了算法的正确性。Magnetron sputtering power is the key equipment of sputtering coating production equipment, and the instability of sputtering process would seriously affect the quality of coating. Therefore, the optimization design of control algorithm for the power is very important to improve the stability of sputtering process. In view of the power used in large vacuum film coating equipment, this article put forward the control method which combine gearshift integral PI control with repetitive control, introduced the design process of compound controller in detail, and verified the rationality of this method with MATLAB. A prototype was built in the laboratory, and the tests and operation results proved the correctness of the algorithm.

关 键 词：磁控溅射电源 稳定性 控制算法 

分 类 号：TP301.6[自动化与计算机技术—计算机系统结构]