脉冲N离子束轰击对TiAlN膜层和W18Cr4V高速钢结合力的影响  

Effect of Nitrogen Ion Beam Bombardment on Adhesion of Ion Plated TiAlN Coating to W18Cr4V High-Speed Steel

作　　者：吕树国[1] 刘常升[2] 张罡[1] 

机构地区：[1]沈阳理工大学中俄联合高能束流实验室,辽宁沈阳110159 [2]东北大学材料与冶金学院,辽宁沈阳110004

出　　处：《材料保护》2012年第4期18-20,73,共3页Materials Protection

基　　金：科技部国际合作重点项目(2009DFA4800)

摘　　要：用电弧离子镀在刀具表面制备TiAlN膜层有利于提高其硬度和耐磨性能,但却降低了膜基结合力,影响其使用寿命。采用UVN 0.5D2I脉冲离子束辅助电弧离子镀沉积设备,在W18Cr4V高速钢基材上沉积TiAlN膜层。研究了基材N离子束轰击及在膜层沉积过程中N离子束辅助轰击对TiAlN膜层结合力的影响。结果表明:膜层沉积之前,N离子轰击与基材原子发生了相互作用,造成了原子级洁净的表面,形成了大量的高密度形核点,且形成了含有N元素的改性层;在膜层沉积初期,脉冲N离子束轰击形成了由W,Cr,V,Fe,N,Ti,Al元素组成的具有一定厚度的"扩散层",其与"改性层"的共同作用是膜基结合力提高的主要原因,膜基结合力最高为80 N。A pulse ion beam-assisted arc-ion plating facility was performed to deposit TiAlN coatings on W18Cr4V high-speed steel substrate.The effects of nitrogen ion beam bombardment of substrate before coating deposition and nitrogen ion beam auxiliary bombardment during coating deposition on the adhesion of the ion plated TiAlN coatings to the steel substrate were investigated.It was found that,before coating deposition,nitrogen ion beam bombardment of substrate allowed interaction between the nitrogen ion beam and substrate atom,generating clean surface of atomic level as well as a large amount of high-density nucleation points and N-containing modified layer.In the early stage of coating deposition,pulse nitrogen ion beam bombardment resulted in a diffusion layer composed of W,Cr,V,Fe,N,Ti and Al with a certain thickness.The diffusion layer acted together with the modified layer to increase the adhesion of the ion plated coating to the steel substrate,and the maximum adhesion was as much as 80 N.

关 键 词：电弧离子镀 W18CR4V高速钢 N离子束轰击 TiAlN膜层 结合力 

分 类 号：TG174.444[金属学及工艺—金属表面处理]