氢化物发生-原子荧光光谱法测定Inconel 718合金中痕量硒  被引量:3

Determination of trace selenium in 718 alloy by hydride generation-atomic fluorescence spectrometry

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作  者:向祥蓉[1] 刘虹[1] 王佼[1] 

机构地区:[1]重庆仪表材料研究所,重庆400700

出  处:《分析仪器》2012年第2期37-40,共4页Analytical Instrumentation

摘  要:本文采用氢化物发生-原子荧光光谱法测定Inconel718合金中痕量硒。对影响其测定的负高压、灯电流、载气流量、屏蔽气流量、载流酸类酸度、硼氢化钾等因素进行了较为详细的研究,优化了测定条件,考察了Inconel718合金主要组成元素和基体元素对硒测定的影响。结果表明,用氟化氨溶液络合,柠檬酸溶液作干扰抑制剂能基本消除基体元素和主要组成元素的干扰。硒浓度在0~100μg/L与荧光强度有良好的线性关系,方法的检出限为0.0083μg/L。对铁镍基高温合金标准样品和Inconel 718合金样品进行9次测定,相对标准偏差为1.6%~3.5%。In this paper a simple and fast analytical procedure for the determination of selenium in In- conel 718 alloy by hydride generation atomic fluorescence spectrometry(HG-AFS) was developed. The influence of instrument parameters such as voltage of PMT, current of lamp, atomizer height, carrier gas rate,shield gas rate and concentration of HCI and KBH4 on the determination of selenium were studied, and the optimized conditions were obtained. Interference of coexistent elements and methods to eliminate the interference were investigated in detail. The results showed that ammonium fluoride and citric acid monohydrate were the best masking. Under the optimized conditions, the linear range of selenium is 0 100μg/L, and the detection limit is 0. 0083μg/L. The relative standard deviation is 1.6%-3.5% (n=9) for the standard sample and the sample of Inconel 718 alloy.

关 键 词:氢化物发生-原子荧光光谱法 INCONEL718合金  

分 类 号:O657.31[理学—分析化学] TG115.33[理学—化学]

 

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