一种自交联聚合物的合成及其在水显影化学增幅型负性抗蚀剂中的应用  

SYNTHESIS OF A SELF-CROSSLINKING POLYMER AND ITS APPLICATION IN WATER-DEVELOPABLE,CHEMICALLY AMPLIFIED NEGATIVE PHOTORESIST

作　　者：陈其道[1] 陈明[1] 林天舒[1] 洪啸吟[1] 黄志齐 胡德甫 

机构地区：[1]清华大学化学系,北京100084 [2]北京化学试剂所,北京100022

出　　处：《感光科学与光化学》2000年第2期155-159,共5页Photographic Science and Photochemistry

基　　金：国家自然科学基金!资助项目 ( 5 9773 0 0 7)

摘　　要：本文引入单体MAGME合成了具有自交联作用的MAGME、苯乙烯和N ( 4 羟基苯基 )马来酰亚胺的共聚物 ,并以该聚合物为基体树脂 ,研制了一种新型的水显影化学增幅型负性抗蚀剂 ,并初步研究了其光刻工艺条件 .A new kind of acid-sensitive polymer with T_g=95℃ and M_n=7*!625, M_w=25*!013 (M_w/M_n=3.28) was synthesized by the co-polymerization of styrene, N-(4-hydroxyphenyl) maleimide and methylacrylamidoglycolate methylether(MAGME). This MAGME containing co-polymer can be self-crosslinked via acid-catalyzed condensation reaction when heated. A new kind of chemically amplified negative photoresist without crosslinking agent was studied using this co-polymer as the base resin, which was developable in harmless NaOH-H_2O solution. Diaryliodonium hexafluorophosphate was used in the photoresist as the photo-acid generator to supply the strong acid and phenothiazine was the photosensitizer. The condition of photolithography was preliminarily investigated.\;

关 键 词：自交联 水显影 化学增幅 负性抗蚀剂 显影材料 

分 类 号：TQ572[化学工程—精细化工]